Research Area

Surface Technology

X-Ray Photoelectron Spectrometer XPS

Examples of use:

  • Surface analytical method based on the photoelectric effect
    • qualitative and quantitative element analysis (Z ≥ 3)
    • Determination of chemical states (oxidation states)
    • Detection limits element-dependent 0.1-1 at%
    • depth of information up to approx. 10 nm
    • Element and state distribution images (Imaging)
    • Depth profiles: non-destructive up to 10 nm by angle-dependent measurements (angle resolved XPS; ARXPS), destructive up to several 100 nm by ion etching, monoatomic Ar ions for inorganic and Ar cluster ions for organic materials
  • Substrates
    • Metal
    • Polymers
    • Glass
    • Powders
    • Fibres
    • magnetic by arrangement


Device configuration:

  • Dual X-ray source (Mg Kα: 1253.6 eV and Al Kα: 1468.6 eV)
  • Monochromatic X-ray source (Al Kα: 1468.6 eV)
  • 180° hemispherical analyzer
  • DLD detector (Delay-Line Detection System, up to 128 channels in spectroscopy mode, images with 64,000 pixels)
  • Self-regulating AXIS charge compensation with low-energy electrons
  • Argon cluster ion source GCIS (Ar+ 0.1 - 5.0 keV; Ar+n up to 20.0 keV with n ~ 100-3000) for sample preparation and depth profiles by ion etching
  • Heating up to 600°C and cooling down to -150°C in preparation and analysis chamber
  • Optical positioning system
  • Sample requirements:
    • Solids, UHV compatible
    • Preferred size: approx. 15 x 15 mm2, height up to 3.8 mm
    • Special requirements: diameter up to 100 mm and  max. height 3.8 mm or 59 mm x 9 mm x 12 mm (WxLxH)

Overview of the Devices

Manufacturer:

Kratos Analytical Ltd.

Model:

Axis Ultra DLD

 

Thomas Seemann

Surface Technology

e-mail
Phone: +49 3641 282562

Björn Kretzschmar

Dr.-Ing. Bjoern Kretzschmar

Surface Technology

e-mail
Phone: +49 3641 282554