Examples of use:

Imaging of high vacuum stable

• Metal surfaces
• Plastic surfaces
• Ceramic and glass surfaces
• Powders
• Biological samples
• Polished surfaces
• non-conductive surfaces after coating with carbon or metals or at very low excitation energies

Device configuration:

• Electron source: Schottky field emitter
• Detectors for imaging material contrast and topography contrast
• Resolution up to 0.7 nm (depending on sample)
• Preparation technique for non-conductive surfaces:
  • High-vacuum vapor deposition system for carbon vapor deposition
  • High-vacuum sputtering system for gold or platinum,
  • Critical point drying preparation technique (for biological samples and samples containing water)