Examples of use:

• Characterization of thin films on smooth surfaces
• Measurement of mixed oxide layers or layer stacks (e.g. SiO2-TiO2-SiO2-SiO2-TiO2...)
• Observation of structural changes in layers due to external influences (e.g. tempering)

Device configuration:

• Spectral ellipsometer SE850
• Wavelength range: 350 - 2300 nm
• Step scan analyser measuring principle
• Simultaneous measurement in UV-Vis and NIR range
• Microspot option with focus diameter of approx. 200µm
• Software: SpectraRay II
• Determination of the optical properties (layer thicknesses, refractive indices, absorption coefficients) of layers or layer stacks
• Numerous models for the simulation of the measured data
• Determination of roughness or interfaces (Effective Medium Approximation)
• Gradients of the refractive index (linear, exponential, Gauss)