Research Area

Surface Technology

r-CCVD - Remote Combustion Chemical Vapour Deposition

The process of remote CCVD uses despite to normal CCVD another mechanism of chemical reaction. By hydrolysis, special precursors can be converted to adhesive coatings on versatile substrates. These precursors do not react sufficiently within the flames of CCVD burners. So, by this method it is possible to produce photocatalytically active films based on titanium dioxide.

A combination of r-CCVD and normal CCVD allows the creation of composite coatings, e.g. of SiOx with incorporated TiO2 nanoparticles.

 

Application fields

  • Deposition of films based on titanium dioxide (photocatalytically active layers)
  • Composite layers

Selected literature:

I. Zunke, B.S.M. Kretzschmar, A. Heft, J. Schmidt, A. Schimanski, B. Grünler
Flame pyrolysis – a cost effective approach for depositing thin functional coatings at atmospheric pressure
Handbook of MODERN COATINGS TECHNOLOGIES – Fabrication Methods and Functional Properties 2021 139ff

 

I. Zunke, P. Rüffer, T. Tölke, A. Heft, B. Grünler, A. Schimanski
Deposition of thin functional coatings at atmospheric pressure using combustion chemical vapour deposition
Combustion: Types of Reactions, Fundamental Processes and Advanced Technologies; Nova Science Publishers; New York; 2014; S. 121-168

Dr. Andreas Pfuch


Surface Technology
Team Leader
Physical Technologies

e-mail
Phone: +49 3641 282554