The method of optical emission spectroscopy (OES) is based on the fact that excited atoms emit electromagnetic radiation that is characteristic for the respective chemical element. Following, OES can provide information about the composition of plasmas.

The Physical Technologies Department has been working for years on the characterization of atmospheric plasmas in particular. In combination with appropriate methods for the analysis of exhaust gases (FT-IR spectroscopy or gas measuring devices, e.g. for O₃, NO, NO₂) and using suitable temperature measurement methods, we are able to provide analytical support for new developments in the field of plasma source production. Another field of application is the characterization of process developments based on the use of PECVD processes. As a result of such investigations, various information on gas temperatures and the efficiency of plasma processes can be obtained, depending on the selected plasma parameters.

Examples of possible applications:

• Analysis of the plasma or flame composition
• Optimization of plasma processes with regard to the chemical conversion of the used process gases
• Optimization of plasma coating processes with regard to the chemical conversion of the used process and precursor gases.