A. Pfuch, K. Horn, R. Mix, M. Ramm, A. Heft, A. Schimanski Direct and remote plasma assisted CVD at atmospheric pressure for the preparation of oxide thin films Galvanotechnik 4/2012, S. 814-824
I. Kahle, O. Tröber, S. Trentsch, H. Richter, B. Grünler, S. Hemeltjen, M. Schlesinger, M. Mehring, S. Spange Functional mesoporous alumosilicate nanoparticles as host material to fabricate photo-switchable polymer films Journal of Materials Chemistry, 2011, 21(13), p. 5083–5088
R. Zimmermann, A. Pfuch, K. Horn, J. Weisser, A. Heft, M. Röder, R. Linke, M. Schnabelrauch, A. Schimanski An approach to create silver containing antibacterial coatings by use of Atmospheric Pressure Plasma Chemical Vapor Deposition (APCVD) and Combustion Chemical Vapor Deposition (CCVD) in an economic way Plasma Processes and Polymers, 8 (2011), p. 295-304
A. Pfuch, K. Horn, J. Schmidt, M. Günther, A. Heft, A. Schimanski Application potential of thin silicon oxide films prepared by plasma assisted CVD at atmospheric pressure Galvanotechnik, (12/2010), p. 2884-2889
A. Pfuch, K. Horn, R. Mix, M. Ramm, A. Heft, A. Schimanski Direct and remote plasma assisted CVD at atmospheric pressure for the preparation of oxide thin films Jahrbuch Oberflächentechnik Bd. 66, Hrsg. R. Suchentrunk, Leuze Verlag Bad Saulgau, Germany, ISBN 978-3-87480-259-8, p. 114-124
T. Tölke, A. Kriltz, A. Rechtenbach The influence of pressure on the structure and the self-cleaning properties of sputter deposited TiO2 layers Thin Solid Films 518(2010), p. 4242-4246
K. Horn, A. Pfuch, J. Schmidt New method for an effective corrosion protection on magnesium surfaces METALL (12/2009), p. 661-664
M. Dubs, J. Weisser, R. Linke, A. Pfuch, D. Imhof, M. Schnabelrauch Dextran-based coating system for the immobilization of cell adhesion promoting molecules on titanium surfaces Materialwissenschaft und Werkstofftechnik (11/2009), p. 853-860
A. Pfuch, T. Tölke, A. Heft, T. Richter, A. Niemann, A. Rechtenbach, M. Frigge Glass covers for photovoltaic applications with enhanced transmission and self-cleaning properties Solar Energy: Research Technology and Applications, Edt.: W. L. Olofsson and V. I. Bengtsson, 2008 Nova Science Publishers, Inc., Hauppauge NY, ISBN 978-1-60456-739-7
T. Tölke, A. Heft, A. Pfuch Photocatalytically active multi-layer systems with enhanced transmission Thin Solid Films (14/2008), p. 4578-4580
A. Pfuch, S. Schiemann, I. Erler, A. Schimanski Between Pretreatment and Painting Kunststoffe international (6/2008), p. 45-47
A. Niemann, C. Schmoranzer, R. Grunwald, W. Seeber Photocatalytic active layers with self-cleaning potential for NLO applications prepared by spray pyrolysis Phys. Chem. Glasses: Eur. J. Glass Sci. Techn. B (2/2008) Vol. 49, p. 55-58
A. Hertzsch, K. Kröger, R. Weidl A simple technique for optical thin film characterisation with small refractive index differences between coating and substrate Glass Technol. A (1/2008) Vol. 49, p. 41-46
A. Pfuch, S. Schiemann, I. Erler, A. Heft, A. Schimanski Tensile adhesion test for paint Kunststoffe International (3/2007), p. 16-19
A. Heft, T. Tölke, A. Pfuch, C. Erbe Photocatalytically active thin films on float glass with enhanced hydrophilicity and transmission for photovoltaic applications Solar Energy Materials & Solar Cells (17/2006), p. 2846-2854
A. Pfuch, A. Heft, M. Ertel, S. Schiemann, A. Schimanski Effectiveness of Pretreatment Kunststoffe International (3/2006), p. 1-4
A. Pfuch, A. Heft, R. Weidl, K. Lang Characterization of SiO2 thin films prepared by plasma-activated chemical vapour deposition Surface and Coatings Technology (1-2/2006), p. 189-196
R. Weidl, A. Schimanski, B. Grünler, U. Kriltz, J.-M. Lemmer, D. Maikowski Pyrosil®- A Innovative Way to Deposit SiO2 Guardian Journal (2006)
A. Schimanski, T. Solomun, H. Sturm, E. Illenberger Efficient Formation of Difluoramino Functionalities by Direct Flourination of Polyamides Macromolecules (38(10)/2005), p. 4231-4236
H.-J. Tiller, A. Schimanski, B. Zobel, R. Weidl Deposition of SiOx on glass surfaces. An atmospheric process for various applications Verre (4/2005), p. 27-30
T. Solomun, A. Schimanski, H. Sturm, R. Mix, E. Illenberger Reactions of amide group with fluorine as revealed with surface analytics Chemical Physics Letters (387/2004), p. 312-316
A. Pfuch, R. Cihar Deposition of SiOx thin films by microwave induced plasma CVD at atmospheric pressure Surface and Coatings Technology (2-3/2004), p. 134-140
R. Weidl, C. Erbe Deposition of thin multilayer films with self cleaning properties on glass Advanced Materials CVD C191A (2004)
U. Bayer, J. Schmidt, M. Frigge, M. Schwagereit Surface Treatment of Aluminium Alloys Containing High Amounts of Silicon Plating & Surface Finishing (11/2001), p. 42-44
