X-ray fluorescence analysis (X-RFA)
Nanomaster (Röntgenanalytik Apparatebau GmbH, Berlin)
- Layer thickness monitor,
Material analysis
- for elements Z ≥ 13
- Quantitative monitoring of electrolyte
- for elements Z ≥ 19
- X-ray fluorescence analysis
- µ-Focus tube, OWG
- I = 0,8 µA
- U = 40 kV
- HiSpeX PIN-Diode &
DPP Collimator: 0,2 mm x 0,5 mm
Applications
- Layer thickness determination of metal coatings
- Electrolyte monitoring
- Qualitative alloy analysis
- Detection of impurities
Advantages
- non-invasive
- simple
- fast
Examples
Numerous electrolytes for depositing pur-poses underlie unpredictable fluctuations in concentration. These fluctuations can proba-bly lead to sensitive deposition performance consequences and occur because of the si-multaneous reduction of layer forming spe-cies in the depositing process and following re-concentration steps. Because of its mini-mum in time consumption X-RFA methods have been established to monitor several electrolyte systems. Furthermore the thick-ness of electroless nickel coatings can be obtained by X-RFA methods to assure cus-tomers their product guarantee with an ac-cepted method. Last but not least X-RFA me-thods can be utilised to do material analysis. Alloys can be compared or impurities with Z ≥ 12 can be tracked in several matrices with Z ≥ 12 for quality control purposes.
