ULTRAObjective measuring system – cantilever based scanning probe microscope
The ULTRAObjective measuring system by SIS GmbH is a cantilever based scanning probe microscope and is used for generation of surface pictures in addition to further data e.g. roughness, magnetic force and resistance. The appropriate measuring head is fixed in the nose piece of a light microscope (Axioskop, by ZEISS) like a customary objective. This combination allows a precise selection of the desired region of the scan.
The different available cantilevers for measurement, on which the according stylus tips are sited, enables diverse fields of applications. The atomic force microscope (AFM)is the most used but there are also branches like magnetic force microscope (MFM) or electrostatic force microscope (EFM). Special stylus tips offer resolutions smaller than 1 nm.
The samples need no special preparations but the surfaces have to be compact, very clean, free of dust and greaseless. Furthermore the samples have to be plane and parallel to the stage.
Technical data
- max. scan size: 22 µm x 22 µm
- max. image resolution: 1024 x 1024 pixel
Measurement methods
- atomic force microscope AFM
- magnetic force microscope MFM
- further methods on application
Measurement category
- topography
- phase
- field contrast
- magnetism
Image presentation
- 2D
- 3D
- section
Measurement mode
- static (contact)
- dynamic (non contact)
2D view
3D view with pyrosil coating