R-CCVD - Remote Combustion Chemical Vapour Deposition
The so-called remote combustion chemical vapour deposition is a new development of Innovent. Hereby the flames also are used to deposit thin films. Contrary to the CCVD this method is based on an other chemical reaction mechanism and offers further abilities of deposition of layer systems which are not practicable by means of CCVD, e.g. titanium dioxide.
applications
- photocatalytically active layers (easy to clean coatings)
- transmission enhancements / reflexion reduction of transparent substrates
substrates
- glass
- polymers
- ceramics
- metals
- stone
- wood