Publikationen Oberflächentechnik 2010
- A. Pfuch, K. Horn, J. Schmidt, M. Günther, A. Heft, A. Schimanski
Application potential of thin silicon oxide films prepared by plasma assisted CVD at atmospheric pressure
Galvanotechnik, (12/2010), S. 2884-2889 - A. Pfuch, K. Horn, R. Mix, M. Ramm, A. Heft, A. Schimanski
Direct and remote plasma assisted CVD at atmospheric pressure for the preparation of oxide thin films
Jahrbuch Oberflächentechnik Bd. 66, Hrsg. R. Suchentrunk, Leuze Verlag Bad Saulgau, Germany, ISBN 978-3-87480-259-8, S. 114-124 - A. Pfuch, K. Horn, J. Schmidt, M. Günther, A. Heft, A. Schimanski
Application potential of thin silicon oxide films prepared by plasma assisted CVD at atmospheric pressure
Jahrbuch Oberflächentechnik Bd. 66, Hrsg. R. Suchentrunk, Leuze Verlag Bad Saulgau, Germany, ISBN 978-3-87480-259-8, S. 107-113 - St. Kuhn, R. Linke, Th. Hädrich
Modification of hot glass surface with alumina by combustion CVD
Surface & Coatings Technology 205 (2010),S. 2091–2096 - T. Struppert, A. Jakob, A. Heft, B. Grünler, H. Lang
The use of silver(I)-2-[2-(2-methoxyethoxy)ethoxy]acetate as precursor in the deposition of thin silver layers on float glass by the atmospheric pressure combustion chemical vapor deposition process
Thin Solid Films 518(2010), S. 5741-5744 - T. Tölke, A. Kriltz, A. Rechtenbach
The influence of pressure on the structure and the self-cleaning properties of sputter deposited TiO2 layers
Thin Solid Films 518(2010), S. 4242-4246